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CVD Equipment

AM-Adjacent EquipmentCentral Islip, NY, USAFounded 1982· One of 180 AM-Adjacent Equipment companies tracked by AMPulse

Designs and manufactures chemical vapor deposition (CVD), thermal processing, physical vapor transport, and gas delivery systems for advanced materials and coatings.

CEO / Founder
Emmanuel Lakios
Team Size
51-200
Stage
Public
Total Funding
$5.2M
Latest Round
Post-IPO

Technology & Products

Key Products

CVD systems; CVI (chemical vapor infiltration) systems; PVT (physical vapor transport) systems; Gas and chemical delivery control systems; Thermal processing equipment

Technological Advantage

Proprietary process expertise and patents in deposition equipment; strong relationships with research institutions like Stony Brook University for advanced materials development.

Differentiation

Value Proposition

Provides turnkey deposition systems that enable production of advanced materials and coatings with high precision and scalability, reducing time-to-market for R&D and production applications.

How They Differentiate

Focus on niche applications like CMC coatings and SiC crystal growth, with customizable systems and strong R&D partnerships.

Market & Competition

Target Customers

Aerospace, defense, semiconductor, energy storage, and advanced materials manufacturers

Industry Verticals

Aerospace; Defense; Semiconductor; Energy Storage; Medical

Competitors

CoorsTek; Mersen; SGL Carbon

Growth & Milestones

Growth Metrics

new_orders_january_usd: 9.3 million

Major Milestones

Received $3.5M follow-on CVI system order (Nov 2024); Received $3.7M aerospace order for production coating system; Acquired MesoScribe Technologies (2017); Appointed Emmanuel Lakios as President and CEO (Feb 2021)

Funding rounds

  • Post-IPO$5.2M2007-09Source: Reuters